Publications
2020
- Molecular Layer Deposition of “Magnesicone”, a Magnesium-Based Hybrid Material.
Kint, J.; Mattelaer, F.; Vandenbroucke, S. S. T.; Muriqi, A.; Minjauw, M. M.; Nisula, M.; Vereecken, P. M.; Nolan, M.; Dendooven, J.; Detavernier, C. Chem. Mater. 2020, 32 (11), 4451–4466.
https://doi.org/10.1021/acs.chemmater.9b05116. - First Principles Study of Reactions in Alucone Growth: The Role of the Organic Precursor.
Muriqi, A.; Nolan, M. Dalt. Trans. 2020, 49 (25), 8710–8721.
https://doi.org/10.1039/d0dt01376e. - A Carbene Stabilized Precursor for the Spatial Atomic Layer Deposition of Copper Thin Films.
Boysen, N.; Misimi, B.; Muriqi, A.; Wree, J. L.; Hasselmann, T.; Rogalla, D.; Haeger, T.; Theirich, D.; Nolan, M.; Riedl, T.; Devi, A. Chem. Commun. 2020, 56 (89), 13752–13755.
https://doi.org/10.1039/d0cc05781a. - Organic-Component Dependent Crystal Orientation and Electrical Transport Properties in ALD/MLD Grown ZnO-Organic Superlattices.
Ghiyasi, R.; Tewari, G. C.; Karppinen, M. J. Phys. Chem. C 2020, 124 (25), 13765–13770.
https://doi.org/10.1021/acs.jpcc.0c03053. -
Vapor phase processing: a novel approach for fabricating functional hybrid materials
Ashurbekova, Ka.; Ashurbekova, Kr.; Botta, G.; Yurkevich, O. and Knez, M. Nanotechnology, 2020, 31, 342001 (32pp)
https://doi.org/10.1088/1361-6528/ab8edb
https://iopscience.iop.org/article/10.1088/1361-6528/ab8edb/meta -
Mitigation of photon background in nanoplasmonic all-on-chip Raman sensors
Reynkens, K.; Clemmen, S.; Raza, A.; Zhao, H.; Peñaranda, J. S.-D.; Detavernier, C.; Baets, R. Mitigation of Photon Background in Nanoplasmonic All-on-Chip Raman Sensors. Opt. Express 2020, 28 (22), 33564.
https://doi.org/10.1364/oe.408638.
2021
- Vapor Phase Processing: A Novel Approach for Fabricating Functional Hybrid Materials.
Ashurbekova, K.; Ashurbekova, K.; Botta, G.; Yurkevich, O.; Knez, M.; Knez, M. Nanotechnology. Institute of Physics Publishing August 21, 2020.
https://doi.org/10.1088/1361-6528/ab8edb. - Converting Molecular Layer Deposited Alucone Films into Al2O3/Alucone Hybrid Multilayers by Plasma Densification.
Santo Domingo Peñaranda, J.; Nisula, M.; Vandenbroucke, S. S. T.; Minjauw, M. M.; Li, J.; Werbrouck, A.; Keukelier, J.; Pitillas Martínez, A. I.; Dendooven, J.; Detavernier, C. Dalt. Trans. 2021, 50 (4), 1224–1232.
https://doi.org/10.1039/d0dt03896b. - Atomic Layer Deposition of Insulating Alf3/Polyimide Nanolaminate Films.
Li, X.; Vehkamäki, M.; Heikkilä, M.; Mattinen, M.; Putkonen, M.; Leskelä, M.; Ritala, M. Coatings 2021, 11 (3).
https://doi.org/10.3390/coatings11030355. - About the Importance of Purge Time in Molecular Layer Deposition of Alucone Films.
Jain, H.; Poodt, P. Dalt. Trans. 2021, 50 (17), 5807–5818.
https://doi.org/10.1039/d1dt00623a. - Organic-Component Dependent Thermal Conductivity Reduction in ALD/MLD Grown ZnO:Organic Superlattice Thin Films.
Ghiyasi, R.; Milich, M.; Tomko, J.; Hopkins, P. E.; Karppinen, M. Appl. Phys. Lett. 2021, 118 (21).
https://doi.org/10.1063/5.0052450. - Rational Development of Guanidinate and Amidinate Based Cerium and Ytterbium Complexes as Atomic Layer Deposition Precursors: Synthesis, Modeling, and Application.
Kaur, P.; Mai, L.; Muriqi, A.; Zanders, D.; Ghiyasi, R.; Safdar, M.; Boysen, N.; Winter, M.; Nolan, M.; Karppinen, M.; Devi, A. Chem. - A Eur. J. 2021, 27 (15), 4913–4926.
https://doi.org/10.1002/chem.202003907. - Role of terminal groups in aromatic molecules on the growth of Al2O3-based hybrid materials.
Muriqi, A.; Karppinen, M.; Nolan, M. Dalton Trans., 2021,50, 17583-17593
https://doi.org/10.1039/D1DT03195C - A study on the influence of ligand variation on formamidinate complexes of yttrium: New precursors for atomic layer deposition of yttrium oxide
Sebastian M. J. Beer, Nils Boysen, Arbresha Muriqi, David Zanders, Thomas Berning, Detlef Rogalla, Claudia Bock, Michael Nolan, Anjana Devi, Dalton Trans., 2021, 50, 12944-12956
https://doi.org/10.1039/D1DT01634B
2022
- Selective Vapor-Phase Doping of Pt Nanoparticles into Phase-Controlled Nanoalloys.
Poonkottil, N; Ramachandran, K,R; Solano, E; Srinath, N,V; Feng, J; Werbrouck, A; Van Daele, M; Filez, M; Minjauw, M; Poelman, H; Coati, A; Detavernier, C* and Dendooven, J.* J. Phys. Chem. C 2022, 126, 3, 1426–1438
https://doi.org/10.1021/acs.jpcc.1c10143 -
Atomic / Molecular Layer Deposition of Cerium (III) Hybrid Thin Films using Rigid Organic Precursors.
Parmish Kaur, Arbresha Muriqi, Jan-Lucas Wree, Ramin Ghiyasi, Muhammad Safdar, Michael Nolan, Maarit Karppinen and Anjana Devi Dalton Trans., 2022,51, 5603-5611
https://doi.org/10.1039/D2DT00353H -
Spatial atmospheric pressure molecular layer deposition of alucone films using dimethylaluminum isopropoxide as the precursor
Hardik Jain, Mariadriana Creatore, Paul Poodt Dalton Trans., 2022, 51, 7918-7927
https://doi.org/10.1039/D2DT00570K -
Ferromagnetic Europium Sulfide Thin Films: Influence of Precursors on Magneto-Optical Properties.
Sebastian M. J. Beer, Arbresha Muriqi, Patrick Lindner, Manuela Winter, Detlef Rogalla, Michael Nolan, Andreas Ney, Jörg Debus, and Anjana Devi Chem. Mater., 2022, 34, 1, 152–164
https://doi.org/10.1021/acs.chemmater.1c02958