Publications
2020
- Molecular Layer Deposition of “Magnesicone”, a Magnesium-Based Hybrid Material.
Kint, J.; Mattelaer, F.; Vandenbroucke, S. S. T.; Muriqi, A.; Minjauw, M. M.; Nisula, M.; Vereecken, P. M.; Nolan, M.; Dendooven, J.; Detavernier, C. Chem. Mater. 2020, 32 (11), 4451–4466.
https://doi.org/10.1021/acs.chemmater.9b05116. - First Principles Study of Reactions in Alucone Growth: The Role of the Organic Precursor.
Muriqi, A.; Nolan, M. Dalt. Trans. 2020, 49 (25), 8710–8721.
https://doi.org/10.1039/d0dt01376e. - A Carbene Stabilized Precursor for the Spatial Atomic Layer Deposition of Copper Thin Films.
Boysen, N.; Misimi, B.; Muriqi, A.; Wree, J. L.; Hasselmann, T.; Rogalla, D.; Haeger, T.; Theirich, D.; Nolan, M.; Riedl, T.; Devi, A. Chem. Commun. 2020, 56 (89), 13752–13755.
https://doi.org/10.1039/d0cc05781a. - Organic-Component Dependent Crystal Orientation and Electrical Transport Properties in ALD/MLD Grown ZnO-Organic Superlattices.
Ghiyasi, R.; Tewari, G. C.; Karppinen, M. J. Phys. Chem. C 2020, 124 (25), 13765–13770.
https://doi.org/10.1021/acs.jpcc.0c03053. -
Vapor phase processing: a novel approach for fabricating functional hybrid materials
Ashurbekova, Ka.; Ashurbekova, Kr.; Botta, G.; Yurkevich, O. and Knez, M. Nanotechnology, 2020, 31, 342001 (32pp)
https://doi.org/10.1088/1361-6528/ab8edb
https://iopscience.iop.org/article/10.1088/1361-6528/ab8edb/meta -
Mitigation of photon background in nanoplasmonic all-on-chip Raman sensors
Reynkens, K.; Clemmen, S.; Raza, A.; Zhao, H.; Peñaranda, J. S.-D.; Detavernier, C.; Baets, R. Mitigation of Photon Background in Nanoplasmonic All-on-Chip Raman Sensors. Opt. Express 2020, 28 (22), 33564.
https://doi.org/10.1364/oe.408638.
2021
- Vapor Phase Processing: A Novel Approach for Fabricating Functional Hybrid Materials.
Ashurbekova, K.; Ashurbekova, K.; Botta, G.; Yurkevich, O.; Knez, M.; Knez, M. Nanotechnology. Institute of Physics Publishing August 21, 2020.
https://doi.org/10.1088/1361-6528/ab8edb. - Converting Molecular Layer Deposited Alucone Films into Al2O3/Alucone Hybrid Multilayers by Plasma Densification.
Santo Domingo Peñaranda, J.; Nisula, M.; Vandenbroucke, S. S. T.; Minjauw, M. M.; Li, J.; Werbrouck, A.; Keukelier, J.; Pitillas Martínez, A. I.; Dendooven, J.; Detavernier, C. Dalt. Trans. 2021, 50 (4), 1224–1232.
https://doi.org/10.1039/d0dt03896b. - Atomic Layer Deposition of Insulating Alf3/Polyimide Nanolaminate Films.
Li, X.; Vehkamäki, M.; Heikkilä, M.; Mattinen, M.; Putkonen, M.; Leskelä, M.; Ritala, M. Coatings 2021, 11 (3).
https://doi.org/10.3390/coatings11030355. - About the Importance of Purge Time in Molecular Layer Deposition of Alucone Films.
Jain, H.; Poodt, P. Dalt. Trans. 2021, 50 (17), 5807–5818.
https://doi.org/10.1039/d1dt00623a. - Organic-Component Dependent Thermal Conductivity Reduction in ALD/MLD Grown ZnO:Organic Superlattice Thin Films.
Ghiyasi, R.; Milich, M.; Tomko, J.; Hopkins, P. E.; Karppinen, M. Appl. Phys. Lett. 2021, 118 (21).
https://doi.org/10.1063/5.0052450. - Rational Development of Guanidinate and Amidinate Based Cerium and Ytterbium Complexes as Atomic Layer Deposition Precursors: Synthesis, Modeling, and Application.
Kaur, P.; Mai, L.; Muriqi, A.; Zanders, D.; Ghiyasi, R.; Safdar, M.; Boysen, N.; Winter, M.; Nolan, M.; Karppinen, M.; Devi, A. Chem. - A Eur. J. 2021, 27 (15), 4913–4926.
https://doi.org/10.1002/chem.202003907.
2022
- Selective Vapor-Phase Doping of Pt Nanoparticles into Phase-Controlled Nanoalloys.
Poonkottil, N; Ramachandran, K,R; Solano, E; Srinath, N,V; Feng, J; Werbrouck, A; Van Daele, M; Filez, M; Minjauw, M; Poelman, H; Coati, A; Detavernier, C* and Dendooven, J.* J. Phys. Chem. C 2022, 126, 3, 1426–1438
https://doi.org/10.1021/acs.jpcc.1c10143 -
Atomic / Molecular Layer Deposition of Cerium (III) Hybrid Thin Films using Rigid Organic Precursors.
Parmish Kaur, Arbresha Muriqi, Jan-Lucas Wree, Ramin Ghiyasi, Muhammad Safdar, Michael Nolan, Maarit Karppinen and Anjana Devi Dalton Trans., 2022,51, 5603-5611
https://doi.org/10.1039/D2DT00353H -
Spatial atmospheric pressure molecular layer deposition of alucone films using dimethylaluminum isopropoxide as the precursor
Hardik Jain, Mariadriana Creatore, Paul Poodt Dalton Trans., 2022, 51, 7918-7927
https://doi.org/10.1039/D2DT00570K